Research

Research Activities:

• Fabrication of high aspect ratio microstructures (Typ. 30:1), Maximum etching depth ~ 2 mm;

• Processing of PMMA and SU-8.

• Fabrication of EDM electrodes for industrial applications

• Patterning of silica thin films

• Direct patterning of block copolymers

• In situ synthesis of  nanoparticles

• Direct patterning of functional devices in silica, hybrid silica, titania, zinc oxide, nickel oxide

• Patterning of titanosilicate mesoporous Pillared Planar Nanochannels

• Patterned supports to position and functionalize  metal-organic framework crystals